En | Fr

Your technological partner

From proof of concept to small production

Home  Facilities  

Metal Evaporators : MEB550 from Plassys



Evaporation mode  :  electron gun at 10 kW


Deposition temperature : 

  • first tool : from ambient to 550°C


  • first tool : from -80°C to 550°C


In situ thickness measurement using a quartz microbalance


Capabilities of etch step before deposition with an ion gun (Ar+)


Size and type of samples : from small samples to 4 inches wafers (transparent, metal and semiconductor sample)


Possibility of static oxydation due to a O2 lign





Metal available  :

Tool n°1 : Ti, Cr, Al, Au, Ni, Pt, Ge, Pd, Nb, V 

Tool n° 2 : Ti, Cr, Al, Au, NiFe, CoFe, Cu, Ag, Sn, Ta 


Deposition rate : from 0.1 nm/sec to 1nm/sec


Thickness range : from a few nm to several hundred of nm


 Contacts en V/Au sur graphène

Contacts en V/Au sur graphène


 Contact : frederic.gustavo@cea.fr

PTA user information

To get full information on that facilitie, connect to user area