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Metal Evaporators : MEB550 from Plassys

TECHNICAL DESCRIPTION:

 

Evaporation mode  :  electron gun at 10 kW

 

Deposition temperature : 

  • first tool : from ambient to 550°C

Evaporator

  • first tool : from -80°C to 550°C

 

In situ thickness measurement using a quartz microbalance

 

Capabilities of etch step before deposition with an ion gun (Ar+)

 

Size and type of samples : from small samples to 4 inches wafers (transparent, metal and semiconductor sample)

 

Possibility of static oxydation due to a O2 lign

 

 

PROCESS CAPABILITIES:

 

Metal available  :

Tool n°1 : Ti, Cr, Al, Au, Ni, Pt, Ge, Pd, Nb, V 

Tool n° 2 : Ti, Cr, Al, Au, NiFe, CoFe, Cu, Ag, Sn, Ta 

 

Deposition rate : from 0.1 nm/sec to 1nm/sec

 

Thickness range : from a few nm to several hundred of nm

 

 Contacts en V/Au sur graphène

Contacts en V/Au sur graphène

 

 Contact : frederic.gustavo@cea.fr

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