PTA facilities for Lithography
Lithography - Tools at a glance
Lithographie
- Lithographique Electronique (100kV)
- Lithographique Nanoimpression
- Aligneur de masque MJB4 (UV et DUV)
- Aligneur de masque MA8 (Face arrière et face avant)
- Lithographique Electronique (100kV)
- Lithographique Nanoimpression
- Aligneur de masque MJB4 (UV et DUV)
- Aligneur de masque MA8 (Face arrière et face avant)
Lithography - Electronic beam lithography : JEOL6300FS
. Gun TFE electron beam source 100kV with 2 modes (High speed or High resolution)
. Alignment if using full correction <15nm
. Sample 5x5mm to 8’’ wafers (maximum writing area on 6’’)
. Alignment if using full correction <15nm
. Sample 5x5mm to 8’’ wafers (maximum writing area on 6’’)
Lithography – Laser : Heidelberg
HEIDELBERG Instrument
µPG 101
µPG 101
Lithography - Mask aligner : MJB4
4 inches Masks aligner with manual aligment
Contact lithography with UV and DUV exposure
Contact lithography with UV and DUV exposure
Lithography - Mask aligner : MA8 (bottom and top sides)
Mask aligner (bottom and top sides) : MA 8