PTA facilities for Lithography
![](http://pta-grenoble.com/wp-content/themes/PTA/timthumb.php?src=http://pta-grenoble.com/wp-content/uploads/2015/10/4-litho.jpg&w=300&h=300&zc=1)
Lithography - Tools at a glance
Lithographie
- Lithographique Electronique (100kV)
- Lithographique Nanoimpression
- Aligneur de masque MJB4 (UV et DUV)
- Aligneur de masque MA8 (Face arrière et face avant)
- Lithographique Electronique (100kV)
- Lithographique Nanoimpression
- Aligneur de masque MJB4 (UV et DUV)
- Aligneur de masque MA8 (Face arrière et face avant)
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Lithography - Electronic beam lithography : JEOL6300FS
. Gun TFE electron beam source 100kV with 2 modes (High speed or High resolution)
. Alignment if using full correction <15nm
. Sample 5x5mm to 8’’ wafers (maximum writing area on 6’’)
. Alignment if using full correction <15nm
. Sample 5x5mm to 8’’ wafers (maximum writing area on 6’’)
![](http://pta-grenoble.com/wp-content/themes/PTA/timthumb.php?src=http://pta-grenoble.com/wp-content/uploads/2016/11/Litho-laser.jpg&w=300&h=300&zc=1)
Lithography – Laser : Heidelberg
HEIDELBERG Instrument
µPG 101
µPG 101
![](http://pta-grenoble.com/wp-content/themes/PTA/timthumb.php?src=http://pta-grenoble.com/wp-content/uploads/2016/05/Litho-Mjb4-photo-02.jpg&w=300&h=300&zc=1)
Lithography - Mask aligner : MJB4
4 inches Masks aligner with manual aligment
Contact lithography with UV and DUV exposure
Contact lithography with UV and DUV exposure
![](http://pta-grenoble.com/wp-content/themes/PTA/timthumb.php?src=http://pta-grenoble.com/wp-content/uploads/2016/05/Litho-MA8-photo-01.jpg&w=300&h=300&zc=1)
Lithography - Mask aligner : MA8 (bottom and top sides)
Mask aligner (bottom and top sides) : MA 8