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From proof of concept to small production

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M70-201 101-01 642-747 70-385 642-980 100-105 98-364 MB5-705 70-534 642-999 CQA 640-878 700-505 70-487 70-411 210-060 640-875 210-260 352-001 70-417 101 1V0-601 70-980 70-489 70-412 E20-465 70-243 70-247 1Z0-803 JN0-360 SY0-401 N10-006 CBAP 010-151 OG0-093 70-410 210-455 640-916 RCDD 70-697 M270-740 300-375 EX200 77-427 EX300 642-584 E20-655 810-403 642-885 642-996 642-887 70-483 NSE4 JN0-332 74-678 70-466 CISA 400-051 220-901 GCIH NSE7 70-486 70-533 CGEIT 2V0-641 101-400 2V0-621D HP0-S41 400-201 300-101 ADM-201 70-494 500-260
 Overview

Overview

Compatible from small samples up to 100 mm wafers, the PTA has a wide range of equipment available for performing all the necessary steps in functionalization of micronic and submicronic objects.

The equipment is classified by technological family:

 

  • Lithography field : the set of technological steps for producing photoresist patterns on the sample. The patterns will subsequently delineate the different areas of the devices to be processed. The PTA has at its disposal equipment for induction and annealing of photoresist on samples ranging from a few mm² to 100 mm wafers. Lithography can be optic (UV, DUV) , electronic with final resolutions of 7 nm or done by nanoimprint.

 

  • Etching field : either chemical or dry, etching enables the substrate / materials to be patterned through lithography or hard mask. The available etching chemistries are proper to the materials to be etched and the etching can be isotropic or anisotropic.

 

  • Deposition field : either by pulverisation and evaporation or by plasma, the depostion enables the depositon of thin film (in the range from the nanometers to the micrometers) of oxyde or metal. The PTA is equipped with a set of depostion tools for metal, oxides, (SiN, SiO2, HfO2, Al2O3...) and semiconductors (Si, Ge,..).

 

  • Metrological field : the PTA provides metrology and monitoring equipment such as optic and electronic microscope, mechanical profilometer, spectroscopic ellipsometer which are indispensable complements in process control.

 

  • Micro & nano systems field : the PTA is equipped with a microsystems line dedicated to fabrication of MEMS and NEMS. This includes: front/back end alignment exposure, chemical mechanical polishing, supercritical drying, vapor HFetcher, and molecular bonding.
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