Les équipement de la PTA en Dépôt
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PVD PLASSYS MP700S
MP700S is a sputtering tool enabling thin film deposition with thicknesses up to several hundred of nanometers. 5 targets availables : Ti, Cr, Au, Ta, W, Cu
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Deposition tools at a glance
- Metal evaporators
- ALD tool (Oxide and metal)
- PECVD tool (SiN, SiO2 and amorphous silicon)
- PVD tools (metal and oxide)
- LPCVD tool (polysilicon and SiN)
- ALD tool (Oxide and metal)
- PECVD tool (SiN, SiO2 and amorphous silicon)
- PVD tools (metal and oxide)
- LPCVD tool (polysilicon and SiN)
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PVD CT100 Alliance Concept
CT100 tool is a two-chamber sputtering system enabling thin film deposition with thicknesses up to several hundred of nanometers. Deposition of metals and oxides : Al, Cr, Ti, Nb, Ta, NbN, TiN, AlN, NiFe (81/19 and 36/64), SiO2, Si3N4, ITO.
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Metal Evaporators : MEB550 from Plassys
Thin film metal deposition tool (up to several hundred of nm)
Deposition made by evaporation using an electron gun
metals availlable : Ti, Cr, Al, Au, Ni, Pt, Ge, Pd, Nb, V, NiFe (81/19), NiCr (80/20), Co, CoFe (60/40), Cu, Ag, Sn, Ta
Deposition made by evaporation using an electron gun
metals availlable : Ti, Cr, Al, Au, Ni, Pt, Ge, Pd, Nb, V, NiFe (81/19), NiCr (80/20), Co, CoFe (60/40), Cu, Ag, Sn, Ta
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PECVD tool : CORIAL D250L
Plasma Enhanced Chimical Vapor Depositon (PECVD) is a tool from Corial to deposit SiN, SiO2 and amorphous (from 50 nm to 2µm)
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LPCVD Tempress
Low Pressure Chemical Vapor Deposition (PECVD) is an tool from Tempress to deposit SiN and polysilicon (from 50 nm to 200 nm)
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Atomic Layer Deposition (ALD) : Fiji 200 from Ultratech
The Fiji 200 is an ALD equipment(Atomic Layer deposition) assisted or not by a remote plasma (O2, N2 and H2)
Deposition of thin and conformal layers (HfO2, Al2O3, TiO2, TiN, ZnO, AZO,..)
Deposition of thin and conformal layers (HfO2, Al2O3, TiO2, TiN, ZnO, AZO,..)
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RTA JIPELEC
Technical characteristics RTA system is an equipment for rapid thermal annealing. Annealings are made from 100°C up to 1000°C and it is design for rapid process typical duration: short ramp time to reach high temperature […]