Metal Evaporators : MEB550 from Plassys
TECHNICAL DESCRIPTION:
Evaporation mode : electron gun at 10 kW
Deposition temperature :
- Tool n°1 : from ambient to 550°C
- Tool n°2 : from -80°C to 550°C
In-situ thickness measurement using a quartz microbalance
Capabilities of etch step before deposition with an ion gun (Ar+)
Size and type of samples : from small samples to 4 inches wafers (transparent, metal and semiconductor sample)
Possibility of static oxydation thanks to an O2 line
PROCESS CAPABILITIES:
Metal available :
Tool n°1 : Ti, Cr, Al, Au, Ni, Pt, Ge, Pd, Nb, V, Ta
Tool n°2 : Ti, Cr, Al, Au, NiCr(80/20), NiFe(81/19), CoFe(60/40), Co, Cu, Ag, Sn, Ta
Deposition rate : from 0.1 nm/sec to 1nm/sec
Thickness range : from a few nm to several hundred of nm
Contacts en V/Au sur graphène
Contact : Guillaume.GAY@cea.fr