En | Fr

Your technological partner

From proof of concept to small production

Home  Facilities  

Lithography – Mask aligner : MJB3

TECHNICAL DESCRIPTION 

 

Litho MJB3 photo 01

  • Contact optical lithography for small samples to 2 inches wafer 

 

  • 3 exposure modes:
    • Soft contact : Mechanical pressure (resolution of 2.0 μm)
    • Hard contact : Mechanical pressure + wafer is pushed harder against the mask (in the range of 1 μm resolution)
    • Vaccum contact : vacuum contact processes yields considerably higher resolution

 

  • Lampe UV (200W)

 

  • All substrat accepted

 

  • 2 or 3 inches masks 

 

  • Alignment accuracy :
    • 1µm

 

 

PROCESS CAPABILITIES

 

Litho Mjb4 photo 03 croix

Main UV photoresit used (down to 0.8µm resolution)

 

 

 

 

 

 

 

 

 

 

 

Contact : jean-luc.thomassin@cea.fr  

 

 

PTA user information

To get full information on that facilitie, connect to user area